To Bosch or Not to Bosch: Etching Silicon

The ability to pattern silicon has been the foundation of modern electronics. Depending on the specific application there are multiple methods to consider. Here we will focus on dry etching and constrain the discussion to well-known methods that can deliver anisotropic (as opposed to isotropic) features....

CORIAL's Top Blog Posts of 2020

For more than 30 years we have been providing those in industry and academia with capital equipment that designs and manufactures plasma etch and deposition systems. The goal of our blog is to provide powerful resources and information for our clients and visitors. We have pulled a list of our most popular blogs of 2020 and hope they bring you new insight into the world of plasma etching. ...

What Does a Plasma Etch Process Engineer Do?

Plasma processing is quickly becoming a staple in healthcare, manufacturing, robotics, and tech. As semiconductors continue to grow and new nanoscale technology (e.g., MEMS, NEMS, etc.) penetrates the mainstream, the role of plasma processing is increasing rapidly....

Etch Performance: 9 Factors to Consider

Etch Rate   Etch rate is the measurable quantity of how fast material is removed from the surface of a wafer and is typically expressed in Å, nm, μm per unit time (e.g. Å/s, nm/min, μm/min). It is usually measured following an etch process by dividing the total thickness change by the time of the etch or by taking several thickness measurements for different etch times and using a “best fit” to the slope. This is done when it is suspected that the etch rate may not be linear with time or that there may be a delay in the onset of etching. Occasionally, it is possible to measure the etch rate in real-time....

How Dry Etching and Deposition Tools Drive the Green Revolution

Driven by concerns over hydrocarbon fuel resources, costs, and environmental impact, energy has moved into the spotlight. New energy sources, and conserving energy, impacts nearly every aspect of our power-dependent lives. ...

How to convert a HDP-CVD system to an ICP-RIE

HDP-CVD — a chemical vapor deposition tool that utilizes an Inductively Coupled Plasma (ICP) source — is an increasingly popular plasma deposition tool. HDP-CVD (also known as ICP-CVD) is capable of generating higher plasma density and quality films at lower deposition temperatures than traditional PECVD machines....