---
title: Optoelectronics | Corial
description: Discover our production-proven plasma technologies for photovoltaics and solid state lighting. Ask us CORIAL's data for sapphire etching and GaN etching.
---

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# Optoelectronics

Production-proven equipment and processes for the optoelectronics industry

- [OPTOELECTRONICS MARKET OVERVIEW](https://corial.plasmatherm.com/en/markets/optoelectronics#overview)
- [CORIAL SOLUTIONS & ADVANTAGES](https://corial.plasmatherm.com/en/markets/optoelectronics#advantages)
- [ETCH PROCESSES](https://corial.plasmatherm.com/en/markets/optoelectronics#etch)
- [DEPOSITION PROCESSES](https://corial.plasmatherm.com/en/markets/optoelectronics#depo)
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## Optoelectronics market overview

Optoelectronics is the branch of electronics that combines optics and electronics. Devices can be divided into two categories – light-sensitive devices and light-generating devices.

Optoelectronic devices can be used in two major end-markets – solid state lighting and photovoltaics.

Some of the common light-sensitive devices used in electronic circuits are photodiodes, phototransistors, light sensitive resistors, photovoltaic cells, and more. Light-generating optoelectronic devices include Laser Diode, High Brightness Light Emitting Diode (HB-LED), Organic LED (OLED),…etc. Some devices combine both the principles of sensitive and light generating devices like Light Dependent Resistors (LDR), Liquid Crystal Displays (LCD), optoisolators, optoreflectors and more.

## CORIAL solutions

CORIAL has been providing equipment and processes for the optoelectronics industry for more than 12 years.

CORIAL etch and deposition technologies are designed to handle the wide range of materials required for optoelectronic devices fabrication, including sapphire, GaN, Si3N4 and SiO2.

## ![Advantages](https://corial.plasmatherm.com/hs-fs/hubfs/CORIAL_May_2020/images/picto-corial-en-brief-1.png?width=40&height=39&name=picto-corial-en-brief-1.png)CORIAL Advantages

### R

#### Unmatched process flexibility for optoelectronics manufacturing

### R

#### Expertise for sapphire patterning on 4" and 6" wafers

### R

#### Low cost of ownership

## ![process](https://corial.plasmatherm.com/hs-fs/hubfs/CORIAL_May_2020/images/Icon-Etch.png?width=35&height=35&name=Icon-Etch.png)Etch processes

We have broad experience processing a wide range of materials with precise control of the etch profile, fast etch rates, and excellent etch uniformity.

[![GaN etch for Mesa structuring (LED manufacturing)](https://corial.plasmatherm.com/hubfs/CORIAL_May_2020/images/GaN-etch-solid-state-lighting-MESA-2.jpeg)](https://corial.plasmatherm.com/hubfs/CORIAL_May_2020/images/GaN-etch-solid-state-lighting-MESA-2.jpeg?hsLang=en)

### **GaN etch for Mesa structuring (LED manufacturing)**

- Etch rate 650 nm/min
- Etch depth 1.5 µm
- Uniformity ± 3%

[![GaN etch for device isolation](https://corial.plasmatherm.com/hubfs/CORIAL_May_2020/images/GaN-deep-etch-isolation.jpeg)](https://corial.plasmatherm.com/hubfs/CORIAL_May_2020/images/GaN-deep-etch-isolation.jpeg?hsLang=en)

### **GaN etch for device isolation**

- Etch depth 7 µm
- Etch rate 1200 nm/min
- Uniformity ±2 %

[![Sapphire etch for PSS application](https://corial.plasmatherm.com/hubfs/CORIAL_May_2020/images/icp-rie-inductive-coupled-plasma-process-sapphire-etching-pss-application.jpg)](https://corial.plasmatherm.com/hubfs/CORIAL_May_2020/images/icp-rie-inductive-coupled-plasma-process-sapphire-etching-pss-application.jpg?hsLang=en)

### **Sapphire etch for PSS application**

- Etch rate 100 nm/min
- Edge exclusion 2 mm
- Uniformity ±2 %

## ![process](https://corial.plasmatherm.com/hs-fs/hubfs/CORIAL_May_2020/images/Icon-Etch.png?width=35&height=35&name=Icon-Etch.png)Deposition processes

The optoelectronics industry necessitates the use of a wide range of dielectric films.

Depositing thin SiO2 and Si3N4 films used as passivation or current blocking layers, CORIAL delivers processes that ensure tight control of film stress (tensile to compressive), and fast deposition rates without any compromise in deposition uniformity, or film quality (low BOE etch rates for SiO2, low KOH and TMAH etch rates for Si3N4).

[![Fast and high temperature SiO2 deposition](https://corial.plasmatherm.com/hubfs/CORIAL_May_2020/images/PECVD-SiO2-HM-D500-PWP-ST.jpg)](https://corial.plasmatherm.com/hubfs/CORIAL_May_2020/images/PECVD-SiO2-HM-D500-PWP-ST.jpg?hsLang=en)

### **Fast and high-temperature SiO2 deposition (hard mask)**

- 1 µm thick deposited at 280°C
- Deposition rate 110 nm/min
- Refactive index 1.68

[![Si3N4 deposition at low RF](https://corial.plasmatherm.com/hubfs/CORIAL_May_2020/images/PECVD-Damage-N2-D350-PWP-ST.jpg)](https://corial.plasmatherm.com/hubfs/CORIAL_May_2020/images/PECVD-Damage-N2-D350-PWP-ST.jpg?hsLang=en)

### **Si3N4 deposition at low RF (photodiodes)**

- RF power 20 W
- Deposition rate 5 nm/min
- Refractive index 1.81

[![Low temperature SiC film deposition for OLED](https://corial.plasmatherm.com/hubfs/CORIAL_May_2020/images/PECVD-SiC-Stress-D500-PWP-ST.jpg)](https://corial.plasmatherm.com/hubfs/CORIAL_May_2020/images/PECVD-SiC-Stress-D500-PWP-ST.jpg?hsLang=en)

### **Low-temperature SiC film deposition (OLED)**

- Deposition rate 30 nm/min
- Deposition at 80°C
- Stress 10 ± 50 MPa

## ![process](https://corial.plasmatherm.com/hs-fs/hubfs/CORIAL_May_2020/images/Icon-Product.png?width=35&name=Icon-Product.png)Products

### Corial 210IL ![process](https://corial.plasmatherm.com/hubfs/CORIAL_May_2020/images/Icon-Etch-process-Negative.png)

![Corial-210IL-zoom](https://corial.plasmatherm.com/hubfs/CORIAL_May_2020/images/Corial-210IL-zoom.jpg "Corial-210IL-zoom")

- ICP-RIE etch system with load-lock
- Fast etch rates for III-VI compounds
- Cluster configuration for integration on the Corial PS200

[Learn more](https://corial.plasmatherm.com/en/products/corial-210il-icp-rie-etch-tool?hsLang=en)

### Corial D250 ![process](https://corial.plasmatherm.com/hubfs/CORIAL_May_2020/images/Icon-deposition-process-Negative.png)

![Corial-D250-Zoom](https://corial.plasmatherm.com/hubfs/CORIAL_May_2020/images/Corial-D250-Zoom.jpg "Corial-D250-Zoom")

- PECVD system with in-situ plasma cleaning
- Low temperature PECVD on organics
- High temperature SiO2, Si3N4, SiOCH, SiOF, SiC and aSi-H films deposition

[Learn more](https://corial.plasmatherm.com/en/products/corial-d250-pecvd-deposition-tool?hsLang=en)

### Corial D250L ![process](https://corial.plasmatherm.com/hubfs/CORIAL_May_2020/images/Icon-deposition-process-Negative.png)

![Corial D250L](https://corial.plasmatherm.com/hubfs/CORIAL_May_2020/images/Corial-D250L-Zoom.jpg "Corial D250L")

- Same capabilities as Corial D250, plus vacuum load-lock for higher throughput

[Learn more](https://corial.plasmatherm.com/en/products/corial-d250l-pecvd-deposition-tool?hsLang=en)

### Corial 360RL ![process](https://corial.plasmatherm.com/hubfs/CORIAL_May_2020/images/Icon-Etch-process-Negative.png)

![Corial-360RL-Zoom](https://corial.plasmatherm.com/hubfs/CORIAL_May_2020/images/Corial-360RL-Zoom.jpg "Corial-360RL-Zoom")

- Large area RIE etch system
- Manual loading for batch up to 7 x 100 mm wafers
- GaAs, GaP, InP, GaN and AlGaN etch

[Learn more](https://corial.plasmatherm.com/en/products/corial-360rl-rie-etch-tool?hsLang=en)

### Corial 360IL ![process](https://corial.plasmatherm.com/hubfs/CORIAL_May_2020/images/Icon-Etch-process-Negative.png)

![Corial-360IL-zoom](https://corial.plasmatherm.com/hubfs/CORIAL_May_2020/images/Corial-360IL-zoom.jpg "Corial-360IL-zoom")

- ICP-RIE etch system for 24/7 production environment
- Load-lock for batch up to 7 x 100mm wafers
- Fast etching rates for sapphire, III-V compounds

[Learn more](https://corial.plasmatherm.com/en/products/corial-360il-icp-rie-etch-tool?hsLang=en)

### Corial D350 ![process](https://corial.plasmatherm.com/hubfs/CORIAL_May_2020/images/Icon-deposition-process-Negative.png)

![Corial-D350-Zoom](https://corial.plasmatherm.com/hubfs/CORIAL_May_2020/images/Corial-D350-Zoom.jpg "Corial-D350-Zoom")

- PECVD deposition system for 24/7 production environment
- Manual loading for up to 300 mm wafers
- High quality SiO2, Si3N4, SiOCH, SiOF, SiC and aSi-H films deposition

[Learn more](https://corial.plasmatherm.com/en/products/corial-d350-pecvd-deposition-tool?hsLang=en)

### Corial D350L ![process](https://corial.plasmatherm.com/hubfs/CORIAL_May_2020/images/Icon-deposition-process-Negative.png)

![Corial-D350L-Zoom](https://corial.plasmatherm.com/hubfs/CORIAL_May_2020/images/Corial-D350L-Zoom.jpg "Corial-D350L-Zoom")

- Same capabilities as Corial D350, plus vacuum load-lock for higher throughput

[Learn more](https://corial.plasmatherm.com/en/products/corial-d350l-pecvd-deposition-tool?hsLang=en)

### Corial D500 ![process](https://corial.plasmatherm.com/hubfs/CORIAL_May_2020/images/Icon-deposition-process-Negative.png)

![Corial-D500-Zoom](https://corial.plasmatherm.com/hubfs/CORIAL_May_2020/images/Corial-D500-Zoom.jpg "Corial-D500-Zoom")

- Very large area PECVD deposition system
- High throughput: 104x2’’ ; 25x4’’ ; 9 x 6’’ or plates up to 500 mm x 500 mm

[Learn more](https://corial.plasmatherm.com/en/products/corial-d500-pecvd-deposition-tool?hsLang=en)

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