Etching tools and deposition tools
Get the best Cost of Ownership with the most versatile, compact and reliable etch and deposition systems of the industry.
CORIAL 200 SERIES – Systems for R&D and Low Volume Production
![Corial 200FA RIE etch system - Plan Corial 200FA RIE etch system - Plan](https://corial.plasmatherm.com/hubfs/CORIAL_May_2020/images/Corial-200S-ATH500-vue-Dim-DR-ss-Hab-plan.jpg)
Corial 200FA
- Deprocessing of dies and packaged dies
- Fast and clean etching of SiO2, Si3N4, and Polyimide layers
- Automated EPD to prevent TiN or metals etch
![Corial 200S RIE etch system - Plan Corial 200S RIE etch system - Plan](https://corial.plasmatherm.com/hubfs/CORIAL_May_2020/images/Corial-200S-ATH500-vue-Dim-DR-ss-Hab-plan.jpg)
Corial 200S
- Simply to use, manually loaded RIE system
- Small wafer pieces up to full 200 mm wafer
- Si, silicon compounds, metals and polymers etch with fluorinated reactive gases
![Corial 200R RIE etch system - Plan Corial 200R RIE etch system - Plan](https://corial.plasmatherm.com/hubfs/CORIAL_May_2020/images/Corial-200R-ATH500-vue-Dim-DR-ss-Hab-plan.jpg)
Corial 200R
- Easy to use system
- Stepped upgrades available
- For silicon-based compounds, metals and polymers etch
![Corial 210RL RIE etch system - Plan Corial 210RL RIE etch system - Plan](https://corial.plasmatherm.com/hubfs/CORIAL_May_2020/images/Corial-210RL-vue-Dim-DRT-sans-Hab-plan.jpg)
Corial 210RL
- Flexible solution for reactive ion etching
- Compatible with chlorinated chemistries
- Silicon, silicon compounds, polymers, III-V & II-VI compounds and metals etch
![Corial 200I 200 mm ICP-RIE etch system - Plan Corial 200I 200 mm ICP-RIE etch system - Plan](https://corial.plasmatherm.com/hubfs/CORIAL_May_2020/images/Corial-200I-ATH500-vue-Dim-DR-ss-Hab-plan.png)
Corial 200I
- For single wafers over up to 200 mm, dies or packaged dies
- Fluorinated and oxygen based chemistries
- Silicon compounds and polymers etching
![Corial 210IL 200 mm ICP-RIE etch system - Plan Corial 210IL 200 mm ICP-RIE etch system - Plan](https://corial.plasmatherm.com/hubfs/CORIAL_May_2020/images/Corial-210IL-A124H-vue-DIM-DR-ss-Hab.png)
Corial 210IL
- Small wafer pieces up to full 200 mm wafer
- Support ICP, RIE, ALE and DRIE process recipes in the same reactor
- Fast etch rates and excellent uniformities
![Corial 210D 200 mm ICP-CVD equipment Corial 210D 200 mm ICP-CVD equipment](https://corial.plasmatherm.com/hubfs/CORIAL_May_2020/images/Corial-210D-A124H-vue-Dim-DRT-ss-Hab-plan.png)
Corial 210D
- ICP-CVD system for R&D
- Low temperature deposition
- High quality SiO2, Si3N4, SiOCH, SiOF, SiC and aSi-H films
![Corial D250 200 mm PECVD system Corial D250 200 mm PECVD system](https://corial.plasmatherm.com/hubfs/CORIAL_May_2020/images/Corial-D250-vue-DIM-DRT-sans-Hab.png)
Corial D250
- PECVD system for low volume production
- In-situ plasma cleaning
- High quality SiO2, Si3N4, SiOCH, etc… films deposition
![Corial-D250L-vue-DIM-DRT-sans-Hab Corial-D250L-vue-DIM-DRT-sans-Hab](https://corial.plasmatherm.com/hubfs/CORIAL_May_2020/images/Corial-D250L-vue-DIM-DRT-sans-Hab.png)
Corial D250L
- High throughput (load-lock)
- In-situ plasma cleaning
- High quality SSiOF, SiC and aSi-H films, etc…films deposition
CORIAL 300 SERIES – Systems for 24/7 production environment
![Corial 300S Corial 300S](https://corial.plasmatherm.com/hubfs/CORIAL_May_2020/images/Corial-300S-vue-DIM-DR-ss-hab.jpg)
Corial 300S
- Large area reactor chromium etching for photomask fabrication
- From single wafer up to batch processing of 7 x 100 mm wafers
- Retractable liner for metal sputter etch
![Corial 360RL RIE etch system Corial 360RL RIE etch system](https://corial.plasmatherm.com/hubfs/CORIAL_May_2020/images/C360RL-vue-DIM-DRT-Sans-hab-1.jpg)
Corial 360RL
- Large area reactor chromium etching for photomask fabrication
- From single wafer up to batch processing of 7 x 100 mm wafers
- GaAs, GaP, InP, GaN and AlGaN etch
![Corial 360IL 300 mm ICP-RIE etch system - Plan Corial 360IL 300 mm ICP-RIE etch system - Plan](https://corial.plasmatherm.com/hubfs/CORIAL_May_2020/images/Corial-360IL-A124H-vue-DIM-DR-ss-Hab.png)
Corial 360IL
- System for 24/7 production environment
- Load-lock for batch up to 7 x 100mm wafers
- Fast etching rates for sapphire, oxides and polymers etch
![Corial D350 300 mm PECVD system Corial D350 300 mm PECVD system](https://corial.plasmatherm.com/hubfs/CORIAL_May_2020/images/Corial-D350-vue-DIM-DRT-sans-Hab.png)
Corial D350
- PECVD deposition system for 24/7 production environment
- Manual loading for up to 300 mm wafers
- High quality SiO2, Si3N4, SiOCH, SiOF, SiC and aSi-H films deposition
![Corial D350L 300 mm PECVD system with load-lock Corial D350L 300 mm PECVD system with load-lock](https://corial.plasmatherm.com/hubfs/CORIAL_May_2020/images/Corial-D350L-vue-DIM-DRT-sans-Hab.png)
Corial D350L
- PECVD deposition system for 24/7 production environment
- Load-lock to increase throughput
- High quality SiO2, Si3N4, SiOCH, SiOF, SiC and aSi-H films deposition
CORIAL 500 SERIES – Very large area batch system
![Corial D500 high throughput PECVD system Corial D500 high throughput PECVD system](https://corial.plasmatherm.com/hubfs/CORIAL_May_2020/images/Corial-D500-vue-DIM-DRT-sans-Hab.png)
Corial D500
- Very large area PECVD deposition system
- High throughput: 104x2’’ ; 25x4’’ ; 9 x 6’’ or plates up to 500 mm x 500 mm
Software
![Process edition Process edition](https://corial.plasmatherm.com/hubfs/CORIAL_May_2020/Images_Software/Process%20edition.png)
CORTEX®, for continuous wave recipes
- To develop processes, to operate, and to maintain CORIAL systems
- Simple to use GUI interface
- Multiple users access rights
![Process Dev Process Dev](https://corial.plasmatherm.com/hubfs/CORIAL_May_2020/Images_Software/Process%20Dev.png)
CORTEX® Pulse for time multiplexed recipes
- To control and pulse any process parameter, with a minimum pulsation period of 10 ms
- Control of DRIE Bosch, ALE and ALD processes on conventional systems
![Bosch datalog_1 Bosch datalog_1](https://corial.plasmatherm.com/hubfs/Bosch%20datalog_1.png)
GLANCE™ RS, for reprocessing
- Display up to 4 parameters of a run
- Zoom on a specific step to fine tune the process
- Capability to compare 2 runs