The End Product: How CORIAL Solves Problems

Taking an idea or a concept from a customer and turning it into an end product is what we do every day. ...

Etching of Difficult Metals

Over time three primary approaches have been developed to pattern metals: Wet etching, a physical deposition approach known as “lift-off,” and plasma etching. Wet etching, while having relatively low associated equipment costs, are limited by the isotropic nature of the etch mechanism. In this subtractive method, the isotopic etching behavior is only useful for features with non-critical dimensions (e.g. >~5 μm). There is no doubt that wet etching has applicability to larger features where the amount of undercut is small in relation to the feature size. Although wet etching processes are typically highly selective, the extremely reactive reagents often needed to etch metal may damage other exposed materials....

The CORIAL Difference

CORIAL is a high technology company that manufactures equipment used to make semiconductor chips.  The company got started back in 1983, and we’ve had constant innovation over the years. We have the most state-of-the-art process solutions around atomic layer etch and deposition as well as other etch and deposition solutions. ...

Plasma Etch and Deposition Industry

Through technological innovations and a commitment to providing excellence to customers, CORIAL has grown as a leader in the plasma etch and deposition industry. From Grenoble, Thierry Lazerand, the Director of Business Unit at CORIAL, recorded a video message to discuss CORIAL's unique abilities and offerings:...

Looking Back At Achievements in the Last (Crazy) Year

After becoming a subsidiary of Plasma-Therm in 2018, CORIAL continues to grow as the innovation leader in plasma etch and deposition solutions for specialty semiconductor markets. Even with recent challenges due to COVID-19, CORIAL has continued to make advancements as a company. Thierry Lazerand, the Director of Business Unit for CORIAL in Grenoble, recently discussed CORIAL 's achievements over the last few years:...

To Bosch or Not to Bosch: Deep Reactive Ion Etching of Silicon

The ability to pattern silicon has been the foundation of modern electronics. Depending on the specific application there are multiple methods to consider. Here we will focus on dry etching and constrain the discussion to well-known methods that can deliver anisotropic (as opposed to isotropic) features....