---
title: CORIAL's history | Corial
description: 30 years of innovation in customer support, plasma tools development, and customization of plasma etch and deposition processes.
---

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                                        - [Shuttleline® 200](https://corial.plasmatherm.com/en/products/shuttline-200)
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                                        - [Takachi](https://corial.plasmatherm.com/products-takachi)
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                            - CORTEX®
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                                        - [CORTEX® Pulse](https://corial.plasmatherm.com/en/products/cosma-pulse-control-software-for-time-multiplexed-processes-0)
                                        - Control software for time multiplexed processes
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                            - GLANCE™
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                                        - [GLANCE™](https://corial.plasmatherm.com/en/products/cosma-rs-reprocessing-software)
                                        - Reprocessing Software
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## A true innovator for more than 30 years

**The 2010s**

**Company**

### 2018

Plasma-Therm completes acquisition of CORIAL. The transaction is expected to produce significant  operational synergies while increasing the group’s top line revenue by leveraging the combined sales and service network

**Product**

### 2016

CORIAL unveils new ICP reactor for deep etching  
of hard materials

CORIAL announces COSMA Pulse software  
for time-multiplexed processes

**Company**

### 2014

CORIAL ranked 2nd out of 61,000 companies  
for the decade trophy from Bain & Company rewarding  
the best performing French company

**Company**

### 2013

CORIAL opens new facility in France

**Company**

### 2011

CORIAL receives award from Presence for best SME performance

CORIAL is the #1 provider of PSS etch systems to LED manufacturers with the Corial 300IL

CORIAL launches very high throughput PECVD system, the Corial D500, for LED and OLED mass production

**Company**

### 2010

CORIAL receives best supplier award from  
GENESIS PHOTONICS, Taiwan

**The 2000s**

**Product**

### 2009

CORIAL launches the first ICP-CVD equipment for  
MEMS and Semiconductors R&D

**Product**

### 2007

CORIAL enters the LED market in Korea  
with ICP-RIE system for PSS application

**Product**

### 2006

CORIAL unveils the first ICP reactor for nanotechnologies

**Product**

### 2005

CORIAL delivers the first PECVD and High Density Plasma  
systems for semiconductor compounds manufacturing in China

**Company**

### 2004

CORIAL was registered as a new company

**Company**

### 2003

Pierre Parrens received the Chaptal award (Physical Arts)  
for his contribution to the French industry

**Company**

### 2001

NEXTRAL acquisition by Swiss holding UNAXIS

Acquisition of Plasma-Therm Inc

**Product**

### 2000

NEXTRAL delivers its first cluster tool,  
the Quadra for Integrated optics manufacturing

**The 1990s**

**Company**

### 1996

Joint Venture with BALZERS, specialized in optical coatings  
and optical disc technologies

**Company**

### 1991

NEXTRAL returns to private ownership

**The 1980s**

**Product**

### 1987

NEXTRAL delivers its first PECVD system,  
the Nextral ND 400 for AMCLD manufacturing

Acquisition by ALCATEL

**Product**

### 1984

NEXTRAL delivers its first RIE system,  
the Nextral NE 110 for R & D applications

1983

The company NEXTRAL was founded

 

**CORIAL’s** core team has been developing their expertise since 1984, within **NEXTRAL**, **ALCATEL**, **BALZERS** and **UNAXIS** companies.

Our reputation as an industry leader is founded on a combination of customer support, product innovation, reliable processes and low cost of ownership.

Our manufacturing excellence benefits our customers, in both research institutions and volume production environments.

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- [ABOUT](https://corial.plasmatherm.com/en/about-corial)
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- [CONTACT US](https://corial.plasmatherm.com/en/contact-us)

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