Understanding DC Bias

Inductively Coupled Plasma (ICP) etching provides the benefit of nearly independent control of chemical and physical contributions to the etching process. The ICP provides the primary input of energy for creating reactive species and ions. A Radio-Frequency (RF) bias on the substrate electrode imparts the means for controlling the ions’ acceleration and the physical aspect of the etching. Understanding how this bias is created, measured, and its effect on the process helps process development efforts....

Endpoint Basics

How do you know the precise moment when your deposition or etching process is completed? How can you tell, with accuracy, that you've etched to a necessary depth, removed a layer or even deposited to a required thickness? The answer is simple: you use endpoints. Here's an introduction to endpoint technology; methods, comparisons, and considerations....

How CORIAL Helped FATRI Increase Production Yield and Capacity

The Client FATRI United Testing & Control Technologies Co., LTD, is a leading service provider of chip design and advanced material synthesis for IoT, sensors, and AI. With four branches across China, FATRI provides chips, sensors, computing modules, calibration systems, and advanced materials to companies across the globe....

Etch Selectivity FAQ

What is Etch Selectivity? Etch selectivity is the ratio of etch rates between materials. The formula for etch selectivity is Selectivity = Etch Rate A/Etch Rate B. It is often used when describing the relative etch rates between a mask (used for patterning) and the etch rate of the material of interest....

8 Top Universities with Plasma Processing Technology

Plasma processing technology (e.g., etching, PECVD, and CVD) is a crucial component of semiconductor manufacturing and nanotechnology. As semiconductors become increasingly common across materials and electronics applications, the use cases for plasma processing are constantly increasing. At the same time, nanotechnology is presenting itself as a significant body of research that promises to provide value across industries — both commercially and non-commercially....

The Butterfly Project

The BUTTERFLY project: Thanks to previous work, notably carried out within the framework of the IAN Bright project, Soitec has developed a disruptive substrate for the growth of LEDs, called InGaNOS (InGaN on sapphire on islands of 100µm to 1mm for LED-based lighting applications blue)....