Understanding DC Bias
Inductively Coupled Plasma (ICP) etching provides the benefit of nearly independent control of chemical and physical contributions to the etching process. The ICP provides the primary input of energy for creating reactive species and ions. A Radio-Frequency (RF) bias on the substrate electrode imparts the means for controlling the ions’ acceleration and the physical aspect of the etching. Understanding how this bias is created, measured, and its effect on the process helps process development efforts....
Plasma Therm Press Release Plasma-Therm Announces Acquisition of OEM Group PVD, RTP and Etch Business
News from Plasma-Therm FOR IMMEDIATE RELEASE MEDIA CONTACT: Nancy Pollock (727) 577-4999 / Nancy.pollock@plasmatherm.com Plasma-Therm Announces Acquisition of OEM Group PVD, RTP and Etch Business ST. PETERSBURG, Fla. (Dec. 3, 2020) — Plasma-Therm, a leading manufacturer of plasma-process equipment for the semiconductor industry, announced today the acquisition of OEM Group’s dry process equipment business....
What Does a Plasma Etch Process Engineer Do?
Plasma processing is quickly becoming a staple in healthcare, manufacturing, robotics, and tech. As semiconductors continue to grow and new nanoscale technology (e.g., MEMS, NEMS, etc.) penetrates the mainstream, the role of plasma processing is increasing rapidly....
What is Cost-of-Ownership for Etch and Deposition Tools
Probably one of the most frequently asked questions in any language is, “how much does it cost.” Usually, what is meant is “what is the price” but learning about cost is probably the better question. When purchasing capital equipment one of the first questions is “can I have a quotation?” And that begins this discussion of cost-of-ownership (CoO)....
The Advantages of Using a PlasmaBox
The PlasmaBox was created to improve the performance of a conventional PECVD (Plasma Enhanced Chemical Vapor Deposition) system. Here is a brief look at the PlasmaBox, its applications, and its benefits....
