An Introduction to HDPCVD
Introduction to HDPCVD No doubt technology has experienced incredible acceleration since the development of the first transistors nearly 75 years ago. Key to that acceleration is the semiconductor industry and its fabrication methods that enabled low cost production of devices that now fuel nearly all aspects of our lives with ubiquitous advances in communication, healthcare, defense, transportation, and computation....
How Dry Etching and Deposition Tools Drive the Green Revolution
Driven by concerns over hydrocarbon fuel resources, costs, and environmental impact, energy has moved into the spotlight. New energy sources, and conserving energy, impacts nearly every aspect of our power-dependent lives....
How to convert a HDP-CVD system to an ICP-RIE
HDP-CVD — a chemical vapor deposition tool that utilizes an Inductively Coupled Plasma (ICP) source — is an increasingly popular plasma deposition tool. HDP-CVD (also known as ICP-CVD) is capable of generating higher plasma density and quality films at lower deposition temperatures than traditional PECVD machines....
