Plasma-Therm completes acquisition of CORIAL

Combination to accelerate the development of innovative stand-alone equipment and advance CORIAL commercialization initiatives globally

ST PETERSBURG, FLORIDA (June 12th, 2018)

Plasma-Therm, the manufacturer of leading plasma etch, deposition, and advanced packaging equipment for the production of specialty semiconductor devices, announced today the successful acquisition of CORIAL, a France-based plasma processing equipment supplier .

“This transaction is expected to produce significant cost savings from operational synergies while increasing the group’s top line revenue by leveraging the combined sales and service network.  This acquisition enforces Plasma-Therm’s commitment to the European market by further enhancing our support infrastructure for the European customer base” stated Abdul LATEEF, Plasma-Therm CEO.  “With this acquisition we take one more step in the execution of our vision of a Technology Center of Excellence and Research in the Grenoble ecosystem” further emphasized Abdul LATEEF.

“CORIAL is a strategic acquisition that strengthens our presence in the R&D market space and for all other markets requiring small footprint and technology-rich equipment.  We are also excited about the addition of the experienced team of Engineers with differentiated know-how for product development.  The combination will leverage Plasma-Therm’s VLSI-award recognized service” says Thierry LAZERAND, Plasma-Therm Director of Marketing.

“We are excited to become a subsidiary of Plasma-Therm. It is a great opportunity for CORIAL to consolidate its future and accelerate the development of innovative stand-alone equipment based on joined CORIAL and Plasma-Therm expertise and advance our commercialization initiatives globally” comments Andrei UVAROV, CORIAL’s Chief Research Officer.

About Plasma-Therm

Plasma-Therm LLC is a manufacturer of leading plasma etch, deposition, and advanced packaging equipment for specialty semiconductor and nanotechnology markets. Plasma-Therm’s plasma- processing and advanced-packaging solutions are used in research, pilot manufacturing, and volume production of wireless, photonics, solid state lighting, MEMS/NEMS, data storage and other devices. Learn more at


Built on more than 30 years of combined experience and expertise, CORIAL is the technology leader driving innovation in plasma etch and deposition equipment for specialty semiconductor markets. At CORIAL, we address a range of end-market applications including optoelectronics, failure analysis, MEMS, power devices, advanced packaging, wireless communication and integrated optics. The technologies offered by the company include RIE, ICP, DRIE, ICP-CVD, PECVD, and ALE/ALD. Our R&D team continuously develops and fine-tunes the etching and deposition processes that will enable our customers to structure the materials of today and tomorrow. With unique features such as precise process control for damage free etch, stress free deposition, or in-situ plasma reactor cleaning for the highest industry uptimes, CORIAL is committed to deliver the highest repeatability with the lowest cost of ownership. CORIAL equipment is designed and manufactured in France. Sales and support are provided worldwide through a network of local offices and agents. For more information, please visit our website at