Plasma processing technology (e.g., etching, PECVD, and CVD) is a crucial component of semiconductor manufacturing and nanotechnology. As…LEARN MORE
Plasma-Therm’s increased presence in Europe solidifies its commitment to the renewed growth in semiconductor manufacturing in the region. ST…LEARN MORE
Built on more than 30 years of combined experience and expertise, CORIAL is the technology leader driving innovation in plasma etch and deposition equipment for specialty semiconductor markets.
We invest 15% of our revenues in R&D, in order to provide the most versatile, reliable, and highest-performing etch and deposition systems for specialty semiconductor markets.
We deliver the only control software that broadens the process capabilities of conventional ICP tools to enable time-multiplexed processes such as the Bosch process, and Atomic Layer Etching (ALE).
Our engineers combine a thorough knowledge of plasma physics and chemistry with rigorous experimental design techniques (D.O.E.) to develop our products and processes.
That technical expertise plus our distribution network enables CORIAL to offer a highly flexible suite of products with low cost of ownership.
At CORIAL, we address a range of end-market applications including MEMS, optoelectronics, failure analysis, power devices, advanced packaging, wireless devices and integrated optics.
Our R&D team continuously develops and fine-tunes the etching and deposition processes that will enable our customers to structure the materials of today and tomorrow.
CORIAL in brief
years of customer support
in research institutes, universities,
specialty semiconductor markets
served by our process solutions
different wafer processing