--- title: Corial D250L PECVD system | Corial description: Get maximum flexibility for deposition processes and substrate shapes with the Corial D250L PECVD system --- [![CORIAL-PT-LOGO-2021 v6](https://corial.plasmatherm.com/hs-fs/hubfs/CORIAL-PT-LOGO-2021%20v6.png?width=3397&height=1147&name=CORIAL-PT-LOGO-2021%20v6.png "CORIAL-PT-LOGO-2021 v6")](https://corial.plasmatherm.com/en?hsLang=en) Menu - [ABOUT](https://corial.plasmatherm.com/en/about-corial) - Blank wrapper - [History](https://corial.plasmatherm.com/en/our-story) - [Partnerships & Awards](https://corial.plasmatherm.com/en/about-corial/partnership) - [Careers](https://corial.plasmatherm.com/en/careers) - [A Plasma-Therm Company](https://corial.plasmatherm.com/en/a-plasma-therm-company) - [Plasma-Therm Website](http://plasmatherm.com/) - [RESOURCES](https://corial.plasmatherm.com/resources) - [MARKETS](https://corial.plasmatherm.com/en/markets/specialty-semiconductor) - Blank wrapper - [Microelectromechanical Systems (MEMS)](https://corial.plasmatherm.com/en/markets/microelectromechanical-systems-mems) - 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third - GLANCE™ - links-wrapper - [GLANCE™](https://corial.plasmatherm.com/en/products/cosma-rs-reprocessing-software) - Reprocessing Software - [SERVICES](https://corial.plasmatherm.com/en/services) - [BLOGS](https://corial.plasmatherm.com/en/blog) - Blank wrapper - [CORIAL Blog](https://corial.plasmatherm.com/en/blog) - [Plasma-Therm Blog](https://blog.plasmatherm.com) - [CONTACT US](https://corial.plasmatherm.com/en/contact-us) - Blank wrapper - [International Network](https://corial.plasmatherm.com/en/international-network) # Corial D250L PECVD system Get maximum flexibility for deposition processes and substrate shapes with the Corial D250L PECVD system [THE PRODUCT IN BRIEF](https://corial.plasmatherm.com/en/products/corial-d250l-pecvd-deposition-tool#description) [KEY BENEFITS](https://corial.plasmatherm.com/en/products/corial-d250l-pecvd-deposition-tool#benefits)[RELATED PROCESSES](https://corial.plasmatherm.com/en/products/corial-d250l-pecvd-deposition-tool#processes)[UPGRADES](https://corial.plasmatherm.com/en/products/corial-d250l-pecvd-deposition-tool#upgrades) ## Corial D250L PECVD system in brief The Corial D250L PECVD tool is designed for low volume production over a wide range of applications for specialty semiconductor markets. The Corial D250L is based on CORIAL’s unique reactor design. It houses an isothermal, pressurized reactor within a vacuum vessel, which is different from conventional PECVD reactors with heated substrate holders. Featuring a next-generation gas showerhead and symmetrical pumping, the Corial D250L delivers excellent deposition uniformity for a wide variety of applications. Equipped with a vacuum load lock, the Corial D250L delivers stable process conditions, short pump down times, and enhanced throughput.   COSMA Pulse software enables pulsing of any recipe parameter. The pulsing feature enlarges the process window to achieve better control of film properties, and supports Atomic Layer Deposition (ALD) in the Corial D250L. The Corial D250L PECVD system achieves rapid and uniform deposition for a wide range of materials including SiO2, Si3N4, SiOCH, SiOF, SiC and aSi-H films, on wafers up to 200 mm diameter. Optimizing film stress control is simple to accomplish thanks to the reactor’s symmetrical design. This PECVD system can operate for years without the need for manual cleaning. ## ![Key Benefits](https://corial.plasmatherm.com/hs-fs/hubfs/CORIAL_May_2020/images/Icon-Key-Bebefits.png?width=35&height=35&name=Icon-Key-Bebefits.png)Key benefits R #### BEST REPRODUCIBILITY Precise and uniform temperature control of the substrate and reactor walls delivers excellent deposition repeatability and uniformity The pressurized, symmetrically-pumped reactor ensures high-quality films free of pinholes R #### HIGH DEPOSITION RATES With an isothermal and pressurized reactor, the Corial D250L delivers uniform, high deposition rates on wafer sizes up to 200 mm Typical deposition rates:  520 nm/min for SiO2, 250 nm/min for Si3N4, 150 nm/min for SiOCH, 100 nm/min for SiC R #### PROCESS FLEXIBILITY CORTEX™ Pulse software-controlled pulsing of any process parameters improves control of film properties and enables Atomic Layer Deposition (ALD) in the Corial D250L deposition system R #### INCREASED UPTIME Load-lock ensures fast loading/unloading and short pump down times No manual cleaning of reactor or vacuum vessel required for many years of operation ## Related processes![Related processes](https://corial.plasmatherm.com/hs-fs/hubfs/CORIAL_May_2020/images/Icon-Etch.png?width=35&height=35&name=Icon-Etch.png) Typical materials that can be processed with the Corial D250L PECVD system include: - Silicon-based compounds : SiO2, Si3N4, SiOCH, SiOF, aSi-H - Hard materials: SiC The Corial D250L can serve a variety of applications in specialty semiconductors markets including: - Optoelectronics - MEMS - Power devices - Wireless Communication - Integrated optics ### Silicon Nitride (Si3N4) PECVD deposition process with tensile stress [![PECVD-Si3N4-Stress-PWP-ST](https://corial.plasmatherm.com/hubfs/CORIAL_May_2020/images/PECVD-Si3N4-Stress-PWP-ST.jpg "Si3N4 deposition with tensile stress and Low KOH")](https://corial.plasmatherm.com/hubfs/CORIAL_May_2020/images/PECVD-Si3N4-Stress-PWP-ST.jpg?hsLang=en) ## Si3N4 deposition with tensile stress and Low KOH **MEMS** - Deposition rate 210 nm/min - Refractive index 2.00 - Stress 130 ± 50 MPa ### High temperature Silicon Dioxide (SiO2) layer deposition for passivation [![High temperature PECVD deposition proces for SiO2 films](https://corial.plasmatherm.com/hubfs/CORIAL_May_2020/images/PECVD-plasma-enhance-chemical-vapor-deposition-process-SiO2-high-temperature.png "High temperature PECVD deposition proces for SiO2 films")](https://corial.plasmatherm.com/hubfs/CORIAL_May_2020/images/PECVD-plasma-enhance-chemical-vapor-deposition-process-SiO2-high-temperature.png?hsLang=en) ## High temperature PECVD deposition proces for SiO2 films **R&D** - Deposition at 320°C - Refractive index 1.46 - Stress -190 ± 50 MPa ### Stress-less Silicon Nitride (Si3N4) PECVD deposition process [![Stress-less Si3N4 deposition](https://corial.plasmatherm.com/hubfs/CORIAL_May_2020/images/PECVD-Si3N4-Stress-PWP-ST.jpg "Stress-less Si3N4 deposition")](https://corial.plasmatherm.com/hubfs/CORIAL_May_2020/images/PECVD-Si3N4-Stress-PWP-ST.jpg?hsLang=en) ## Stress-less Si3N4 deposition **MEMS** - Deposition rate 120 nm/min - Stress -10 ± 50 MPa - Deposition at 280°C ### Silicon Dioxide (SiO2) layer deposition for passivation application [![SiO2 layer deposition for passivation](https://corial.plasmatherm.com/hubfs/CORIAL_May_2020/images/PECVD-BOE-SiO2-D250-PWP-ST-1.jpg "SiO2 layer deposition for passivation")](https://corial.plasmatherm.com/hubfs/CORIAL_May_2020/images/PECVD-BOE-SiO2-D250-PWP-ST-1.jpg?hsLang=en) ## SiO2 layer deposition for passivation **Optoelectronics** - Deposition rate 270 nm/min - Refractive index 1.46 - RF power 230 W ## Upgrades![Icon](https://corial.plasmatherm.com/hs-fs/hubfs/CORIAL_May_2020/images/Icon-Related-Product.png?width=35&height=35&name=Icon-Related-Product.png) The Corial D250L PECVD system can be thoroughly customized with a wide range of features. ##### Additional gas inputs ![Additional gas inputs ](https://corial.plasmatherm.com/hs-fs/hubfs/CORIAL_May_2020/images/Gas-box-211x300.png?width=141&height=200&name=Gas-box-211x300.png) Additional gas inputs (up to 8) for more complex process gas combinations ##### COSMA Pulse software ![COSMA Pulse software adds Atomic Layer Etching and Si DRIE (Bosch Processes) capabilities ](https://corial.plasmatherm.com/hs-fs/hubfs/CORIAL_May_2020/images/COSMA-Pulse.jpg?width=249&height=200&name=COSMA-Pulse.jpg) COSMA Pulse software adds Atomic Layer Deposition capabilities to the Corial 210D by enabling pulsation of any process parameters – including gas flow rate, working pressure, RF power, LF power… ##### Variety of RF power supplies ![Higher and lower watt power supplies with automatic matching network](https://corial.plasmatherm.com/hs-fs/hubfs/CORIAL_May_2020/images/RF-power-supply.png?width=486&height=200&name=RF-power-supply.png) Higher output power supplies with automatic matching network ##### Light tower ![](https://corial.plasmatherm.com/hs-fs/hubfs/CORIAL_May_2020/images/Light-tower.png?width=38&height=200&name=Light-tower.png) The signal light tower provides an easy-to-view indicator of the system’s processing status ##### Laser interferometry ![End point detection by laser interferometry to enhance etch control through automated measurement of etch rate and etch depth](https://corial.plasmatherm.com/hs-fs/hubfs/CORIAL_May_2020/images/End-point-detection.png?width=186&height=200&name=End-point-detection.png) End point detection by laser interferometry to enhance process control through automated measurement of etch/deposition rate, etch depth and deposition thickness [![quote>newsletter](https://no-cache.hubspot.com/cta/default/7547247/2be88541-9961-4fe9-b07c-314e5e653888.png)](https://cta-redirect.hubspot.com/cta/redirect/7547247/2be88541-9961-4fe9-b07c-314e5e653888) [![quote](https://no-cache.hubspot.com/cta/default/7547247/0ee740a6-9189-46b7-b114-011ce7f398c6.png)](https://cta-redirect.hubspot.com/cta/redirect/7547247/0ee740a6-9189-46b7-b114-011ce7f398c6) [![contact](https://no-cache.hubspot.com/cta/default/7547247/d30e55cc-6021-44b7-a53e-75407de513de.png)](https://cta-redirect.hubspot.com/cta/redirect/7547247/d30e55cc-6021-44b7-a53e-75407de513de) ![Corial](https://corial.plasmatherm.com/hubfs/raw_assets/public/CORIAL_May_2020/images/logo-white-1.png) - 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