Corial 300 SERIES – Etch tools and deposition tools for 24/7 Production Environment
High throughput etch and deposition tools with batch loading for wafer processing up to 300 mm
Designed for the 24/7 production environment, the Corial 300 Series offers high-capacity batch loading to drive down production costs without compromising process performance.
All Corial 300 Series systems are built with highly reliable components to achieve high system uptime.
The Corial 300 Series systems are ideal for volume production film etch and deposition for the optoelectronics, MEMS, photomask, and power semiconductor markets.
Corial 300 Series RIE Etch Systems
With chrome and quartz etch capabilities, the Corial 300S RIE system is ideal for mask repair. This product can process mask sizes from 2” x 2” up to 8” x 8”, thanks to a wide array of substrate holders.
The Corial 360RL RIE system is ideally suited for etching III-V compounds such as GaAs, GaP, GaN, and AlGaN. This RIE etcher is also capable of etching chrome and quartz for mask repair applications.
Corial 300 Series ICP-RIE Etch Systems
The CORIAL 360IL is a large area plasma etch system offering high throughput, without compromising process performance or quality. Our PSS (patterned sapphire substrate) processes deliver perfect conical-shaped features, even at the wafer edge, with industry leading uniformity and repeatability.
Corial 300 Series PECVD Deposition Systems
The Corial D350 PECVD system is designed to produce high-quality, uniform films for photonics, optoelectronics, and MEMS device manufacturing. This PECVD system can operate for years without the need for manual cleaning.
The Corial D350L PECVD system offers fast and uniform deposition on full 300 mm wafers, or large batch capacity. Equipped with a vacuum load lock, the Corial D350L delivers stable process conditions, and short pump-down times.