---
title: High temperature PECVD deposition process for SiO2 film
description: High temperature PECVD deposition process for SiO2 film
---

[Blog | CORIAL](https://corial.plasmatherm.com/en/blog)

# [High temperature PECVD deposition process for SiO2 film](https://corial.plasmatherm.com/en/blog/high-temperature-pecvd-deposition-process-for-sio2-film)

 Written by [Corial](https://corial.plasmatherm.com/en/blog/author/corial) | February 28, 2017 at 12:05 PM

## Typical performance

 

- Deposition rate 250 nm/min
- BOE etch rate <100 nm/min
- Stress -190 ± 50 MPa

[View full post](https://corial.plasmatherm.com/en/blog/high-temperature-pecvd-deposition-process-for-sio2-film)

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