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title: Si atomic layer etching process (ALE)
description: Si atomic layer etching process (ALE) | Corial
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# Si atomic layer etching process (ALE)

Feb 28, 2017 | [Plasma Processing Technology](https://corial.plasmatherm.com/en/blog/tag/plasma-processing-technology)

[![Si atomic layer etching process (ALE)](https://corial.plasmatherm.com/hubfs/CORIAL_May_2020/images/Si-ALE-process-1.jpeg "Si atomic layer etching process (ALE)")](https://corial.plasmatherm.com/hubfs/CORIAL_May_2020/images/Si-ALE-process-1.jpeg)

## Si atomic layer etching process (ALE)

## Typical performance

 

- Plasma Enhanced ALE
- Etch rate 1.67 nm/min
- Atomically smooth surfaces

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